In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoSâ‚‚), a next-generation ...
MUNICH, Germany — Asyntis GmbH, a two-year old supplier of plasma etch equipment for semiconductor manufacturing, has raised 4 million euro (about $4.35 million) in a second round of financing that ...
In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...
Tegal Corp. has received an order from an unnamed RFIC maker for its 903 diode plasma etch tool, scheduled for delivery later this year. Tegal (nasdaq: TGL), based in Petaluma, Calif., said the tool ...
The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
A 2D material called chromium oxychloride dramatically outperforms traditional hard masks in chip fabrication, resisting ...
Plasma resistant coatings are advanced protective layers engineered to withstand the aggressive conditions encountered in plasma processing, especially within semiconductor manufacturing. These ...
Researchers from Kyoto University developed a machine learning model to predict the band gap of novel semiconductor materials. Using data from almost 2,000 semiconductor materials, the team tested six ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results